Wafer measurement Wafer measurement

Precilasers' high-performance industrial lasers have the characteristics of narrow linewidth, high power, and long life, and can be used for advanced industrial applications such as semiconductor wafer inspection, wafer measurement, and holographic exposure. We can also provide customized product development solutions to help your scientific research, development, and production.

Wafer measurement-Continuous laser

Real photos	Wavelength	Power	Introduction	Features
	266nm	0.03W 0.1W 0.5W 1W	Based on the quadruple frequency solution, it outputs high-power continuous deep ultraviolet laser, which is suitable for semiconductor precision detection, measurement and other applications	High power Narrow linewidth Long life
	313-325nm	0.3W 1W 2W	Based on high-power, low-noise fiber amplification and frequency summing technology, high-power narrow-linewidth laser output is achieved	High power Narrow linewidth Long life
	355nm	0.02W 0.03W	Based on a single-pass triple frequency scheme, it outputs ultraviolet laser light, suitable for applications such as interference exposure	Stable structure Long coherent Long life
	355nm	0.5W 2W 4W	Based on the resonant frequency doubling solution, it outputs high-power ultraviolet laser, which is suitable for applications such as interference exposure.	High power Long coherent Long life
	532nm	20W 40W 60W 80W	Based on high-power, low-noise ytterbium-doped fiber amplification and frequency doubling technology, high-power narrow-linewidth laser output with a central wavelength of 532nm is achieved.	High power Narrow linewidth Long life

Wafer measurement-Quasi-continuous laser

Real photos	Wavelength	Power	Introduction	Features
	266nm	1-5W	Adopt solid state amplification solution to achieve high repetition rate and high power output, suitable for precision detection	High power Excellent beam quality High power stability High repetition rate
	355nm	1-8W	Adopt solid state amplification solution to achieve high repetition rate and high power output, suitable for precision detection	High power Excellent beam quality High power stability High repetition rate